发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A method for manufacturing a semiconductor device comprises (a) forming a resin layer that includes at least a plurality of a first and a second resin parts, being separated from each other, over a semiconductor substrate having an electrode pad and a passivation film; (b) forming a resin projection in which the first and the second resin parts are integrated by curing the resin layer; and (c) forming a conductive layer that is being connected electrically to the electrode pad and extending over the resin projection, wherein in process (a), the second resin part is formed at least between the electrode pad and the first resin part at a width less than the first resin part.
申请公布号 US2007010045(A1) 申请公布日期 2007.01.11
申请号 US20060428705 申请日期 2006.07.05
申请人 SEIKO EPSON CORPORATION 发明人 ASAKAWA TATSUHIKO;TANAKA SHUICHI;IMAI HIDEO
分类号 H01L21/00 主分类号 H01L21/00
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