发明名称 |
GAS PIPING SYSTEM FOR MANUFACTURING DEVICE OF ELECTRONIC MATERIAL AND METHOD TO PREVENT FLOWING BACKWARD OF PURGE GAS IN THE GAS PIPING SYSTEM |
摘要 |
A gas pipe system of an electron material manufacturing apparatus and a method for preventing back-flow of purge gas in the same are provided to prevent contamination of pipes by using a difference between an inflow pressure of the purge gas and a presetting pressure of a regulator. A process gas inlet valve(MV2) controls supply of process gas. A regulator(REG) supplies the process gas flowed in through the process gas inlet valve to a chamber(40) with a constant pressure. The regulator prevents a back-flow to the process gas inlet valve side when a pressure of the chamber is high. A purge gas inlet valve(MV1) supplies purge gas to a space between an output side of the regulator and the chamber to control it. The regulator includes an inlet pipe, an outlet pipe, and an opening/shutting member. The inlet pipe is connected to the process gas inlet valve. The outlet pipe is connected to the chamber. The opening/shutting member opens and shuts between the inlet pipe and the outlet pipe.
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申请公布号 |
KR20070006292(A) |
申请公布日期 |
2007.01.11 |
申请号 |
KR20050061508 |
申请日期 |
2005.07.08 |
申请人 |
K.C.TECH CO., LTD. |
发明人 |
LEE, SUNG SEUB;LEE, JONG KWAN;JUNG, KEN JUN;KIM, SUNG JUN;NAM, MYOUNG WOO;JUNG, DONG JIN |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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