发明名称 GAS PIPING SYSTEM FOR MANUFACTURING DEVICE OF ELECTRONIC MATERIAL AND METHOD TO PREVENT FLOWING BACKWARD OF PURGE GAS IN THE GAS PIPING SYSTEM
摘要 A gas pipe system of an electron material manufacturing apparatus and a method for preventing back-flow of purge gas in the same are provided to prevent contamination of pipes by using a difference between an inflow pressure of the purge gas and a presetting pressure of a regulator. A process gas inlet valve(MV2) controls supply of process gas. A regulator(REG) supplies the process gas flowed in through the process gas inlet valve to a chamber(40) with a constant pressure. The regulator prevents a back-flow to the process gas inlet valve side when a pressure of the chamber is high. A purge gas inlet valve(MV1) supplies purge gas to a space between an output side of the regulator and the chamber to control it. The regulator includes an inlet pipe, an outlet pipe, and an opening/shutting member. The inlet pipe is connected to the process gas inlet valve. The outlet pipe is connected to the chamber. The opening/shutting member opens and shuts between the inlet pipe and the outlet pipe.
申请公布号 KR20070006292(A) 申请公布日期 2007.01.11
申请号 KR20050061508 申请日期 2005.07.08
申请人 K.C.TECH CO., LTD. 发明人 LEE, SUNG SEUB;LEE, JONG KWAN;JUNG, KEN JUN;KIM, SUNG JUN;NAM, MYOUNG WOO;JUNG, DONG JIN
分类号 H01L21/02 主分类号 H01L21/02
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