发明名称 SYSTEM FOR SCHEDULING WAFER MOVEMENT IN WAFER TREATMENT TOOL, AND ITS METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a system for scheduling wafer movement in a wafer treatment tool, and its method. <P>SOLUTION: This wafer treatment tool (100) comprises a load module (102), wafer transfer unit (104), treatment module (116) and scheduler (118). The scheduler (118) is structured to generate the schedule of a wafer movement in the wafer treatment tool (100) based on the time duration of operations performed by the wafer transfer unit (104) and the treatment module (116) when a wafer is treated. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007005822(A) 申请公布日期 2007.01.11
申请号 JP20060229617 申请日期 2006.08.25
申请人 TOKYO ELECTRON LTD 发明人 JOMA KENTARO;OKI TATSUYA
分类号 H01L21/02;G05B19/418;G06Q50/00 主分类号 H01L21/02
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