发明名称 Layered resistance variable memory device and method of fabrication
摘要 The invention is related to methods and apparatus for providing a resistance variable memory element with improved data retention and switching characteristics. According to one embodiment of the invention, a resistance variable memory element is provided having at least one silver-selenide layer in between two glass layers, wherein at least one of the glass layers is a chalcogenide glass, preferably having a Ge<SUB>x</SUB>Se<SUB>100-x </SUB>composition. According to another embodiment of the invention, a resistance variable memory element is provided having at least one silver-selenide layer in between chalcogenide glass layers and further having a silver layer above at least one of said chalcogenide glass layers and a conductive adhesion layer above said silver layer. According to the another embodiment of the invention, a resistance variable memory element is provided having a first chalcogenide glass layer, a silver layer over said chalcogenide glass layer, a second chalcogenide glass layer over said silver layer, a second silver layer over said second chalcogenide glass layer, and a conductive adhesion layer over said a second silver layer.
申请公布号 US2007007506(A1) 申请公布日期 2007.01.11
申请号 US20060443266 申请日期 2006.05.31
申请人 MICRON TECHNOLOGY, INC. 发明人 CAMPBELL KRISTY A.;LI JIUTAO;MCTEER ALLEN;MOORE JOHN T.
分类号 H01L27/105;H01L29/02;G11C11/34;G11C13/02;H01L21/20;H01L27/10;H01L27/148;H01L27/24;H01L45/00 主分类号 H01L27/105
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