发明名称 ELECTRON BEAM IRRADIATION APPARATUS FOR REFORMING SURFACE
摘要 PROBLEM TO BE SOLVED: To provide a power supply that emits an electron beam pulse from a cathode to a target multiple times while plasma is generated in an electron gun, and to improve a surface reforming effect and quality by making the waveform of each unit electron beam pulse and a time interval therebetween variable so as to make a group pulse. SOLUTION: A high voltage power supply circuit for emitting the electron beam to the target from the cathode of the electron gun where plasma of low pressure ionized gas is sealed, is of a capacitor charge and discharge type. A plurality of capacitors are independently provided and are previously charged. A first capacitor is discharged to emit a first unit electron beam pulse, after a delay time a second capacitor is discharged to emit a second unit electron beam pulse, and further by continuing such step a group pulse consisting of several intermittent unit electron beam pulses is formed to be irradiated to the target. The size and delay time of each unit pulse can be selected, and thus a heat action mode on the target surface is optimized. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007005011(A) 申请公布日期 2007.01.11
申请号 JP20050180693 申请日期 2005.06.21
申请人 SODICK CO LTD 发明人 IZUMI TADAMI
分类号 H01J37/30;C23C26/00;H01J37/077 主分类号 H01J37/30
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