发明名称 Image sensor and method for fabricating the same
摘要 An image sensor includes a first conductivity type substrate with a trench formed in a predetermined portion thereof, a second conductivity type impurity region formed in the first conductivity type substrate below the trench and being a part of a photodiode, a second conductivity type first epitaxial layer filling the trench and being a part of the photodiode, and a first conductivity type second epitaxial layer formed over the second conductivity type first epitaxial layer.
申请公布号 US2007007562(A1) 申请公布日期 2007.01.11
申请号 US20060482770 申请日期 2006.07.10
申请人 MAGNACHIP SEMICONDUCTOR, LTD. 发明人 CHA HAN-SEOB
分类号 H01L31/113;H01L27/146;H01L31/10;H04N5/335;H04N5/369;H04N5/372;H04N5/374 主分类号 H01L31/113
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