| 摘要 |
The invention relates to a process for depositing at least one layer, which contains at least one first component, on at least one substrate in a process chamber, first and second starting materials, of which at least the first starting material contains the first component, being introduced in gaseous form into the process chamber in a cyclically alternating manner, in order to deposit substantially only one layer at a time of the first component with every cycle. In order to increase the spectrum of suitable staring materials that are available the invention proposes that a first starting material which does not intrinsically allow itself to be deposited in a self-limiting manner, is used and, a limiter formed of a hydrocarbon is introduced into the process chamber in such a way that the depositing of the first component on the substrate automatically ends after completion of the first layer.
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