| 摘要 |
<p>Silicon compound for patterning and producing resist composition is provided to inhibit pattern collapse caused by swelling, exhibit optimum acidity for forming microfine pattern, and is used as double layered resist raw material for ArF exposure by adapting the silicon compound having specific fluorine containing cyclic structure. The silicon compound has fluorine containing cyclic structure represented by a formula(1), wherein X^1,X^2 and X^3 is any one selected from: hydrogen; hydroxyl group; halogen atom; linear, branched or cyclic alkoxy group having 1 to 6 of carbon atoms; and monovalent organic group having linear, branched or cyclic or polycyclic skeleton (excluding alkoxy group), Y is single bond or bivalent organic group, and Z is tri-valent organic group. A resist composition includes (A) a silicone resin, (B) an acid generator and (C) solvent.</p> |
