| 发明名称 |
LITHOGRAPHIC APPARATUS, PROJECTION APPARATUS, AND METHOD OF MANUFACTURING SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a projection apparatus and a method of manufacturing the same. <P>SOLUTION: A lithographic apparatus has a control system to control a position of a substrate table. The control system includes: a first detection device for generating a projection system position signal showing a position of a projection system; a second detection device for generating a projection system feed/forward signal; a comparison unit for deducting a signal showing the actual position of the substrate table from a substrate table position reference signal, and generating a servo error signal by adding the projection system position signal; a control unit for generating a first control signal based on the servo error signal; an addition unit for generating a second control signal by adding the feed/forward signal and the first control signal; and an actuator unit for driving the substrate table to a desired substrate table position based on a second control signal. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2007005796(A) |
申请公布日期 |
2007.01.11 |
| 申请号 |
JP20060168255 |
申请日期 |
2006.06.19 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
BUTLER HANS;DRAAIJER EVERT HENDRIK JAN;BREUKERS MARCUS JOSEPH E G |
| 分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
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