首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Method of estimating the concentration of metal contamination in wafer and apparatus for heating wafer
摘要
申请公布号
KR100668101(B1)
申请公布日期
2007.01.11
申请号
KR20050052463
申请日期
2005.06.17
申请人
发明人
分类号
H01L21/324;H01L21/66
主分类号
H01L21/324
代理机构
代理人
主权项
地址
您可能感兴趣的专利
COLD-SETTING COMPOSITION
FORWARD DRIVE OPERATION MECHANISM OF FOUR-WHEELED RIDING TRANSPLANTATION MACHINE
CHAIR ARRANGING DEVICE FOR SEAT OF MOVABLE STAND
STRUCTURE FOR TRAVELING TRANSMITTING POWER OF WALKING TYPE TRACTOR
GASKET FOR INSERTING WINDOW BOARD
CARBAMOYLPYRROLIDONE DERIVATIVE
HANDCART
METHOD AND APPARATUS FOR DETERMINING MICROORGANISM OR THE LIKE
MUSHROOM CULTIVATION
CHROMINANCE SIGNAL PROCESSOR
FACSIMILE EQUIPMENT USING HAND SCANNER
PARTS FIXING METHOD
SEMICONDUCTOR DEVICE
WATER COOLING HEAT STORAGE TYPE BEVERAGE COOLER
PAPER MONEY IDENTIFYING MACHINE
COMMUNICATION CONTROL EQUIPMENT
MAGNETOELECTRIC CONVERSION DEVICE
SEMICONDUCTOR DEVICE
HIGH-FREQUENCY HEATING DEVICE
FABRIC COMPOSED OF FILAMENTOUS HEATING ELEMENTS