| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an electronic apparatus by a microembossing work. <P>SOLUTION: A forming method of an electronic apparatus on a substrate 10 comprises the steps of applying a microembossing work to the substrate 10, applying a surface treatment to the substrate so that a non-depressed part 11 has a quality of repelling a solution of a first material 60, and depositing the solution of a first material 60 on a depression 12 on the substrate 10 formed by the microembossing work. Thereafter, the substrate is anneal-treated so that a first material is made to be a single face with the surface of the substrate. Thereafter, the first material 60 in the depression can be used as a source or a drain in the following step of forming a TFT, for example. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
