发明名称 RADIATION-CURABLE LITHOGRAPHIC INKS FROM MULTIFUNCTIONAL ACRYLATE OLIGOMERS
摘要 <p>The present invention relates generally to radiation-curable ink formulations, and particularly, but not by way of limitation, to a family of radiation-curable ink formulations specifically for lithographic printing applications. The inventive ink formulations are based on multifunctional acrylate resins formed by the reaction of acrylate monomers and oligomers with beta-keto esters (e.g., acetoacetates), beta-diketones (e.g., 2,4-pentanedione), beta-keto amides (e.g., acetoacetanilide, acetoacetamide), and/or other beta-dicarbonyl compounds that can participate in Michael addition reactions.</p>
申请公布号 EP1740650(A1) 申请公布日期 2007.01.10
申请号 EP20050738937 申请日期 2005.04.21
申请人 ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC 发明人 NARAYAN-SARATHY, SRIDEVI;HAHN, LISA, MARIE
分类号 C08K3/28;C08F2/46;C08F8/00;C08F265/04;C08F265/06;C08F283/01;C08F289/00;C08F290/06;C08G2/00;C08K5/00;C08K5/07;C08K5/315;C09D11/10;C09D133/06;C09D133/08;C09D133/14;C09D151/00;C09D151/08;C09D167/07 主分类号 C08K3/28
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