发明名称 |
Control method, temperature control method, adjustment method, temperature controller, program, recording medium and heat treatment device |
摘要 |
<p>When a work (1) is set on a hot plate (2) and a heat treatment is started and the like, an addition waveform of a target temperature is formed based on a previously formed data of an adjustment value, and a temperature is controlled by adding the addition waveform to the target temperature SP, and with the data of the adjustment value, the variation in temperature of the work (1) is prevented using an interference matrix (A) showing a relation between the target temperature SP and the temperature of the work (1).</p> |
申请公布号 |
EP1742133(A2) |
申请公布日期 |
2007.01.10 |
申请号 |
EP20060013389 |
申请日期 |
2006.06.28 |
申请人 |
OMRON CORPORATION |
发明人 |
NANNO, IKUO;TANAKA, MASAHITO;WAKABAYASHI, TAKESHI;YAMADA, TAKAAKI;IWAI, YOSUKE |
分类号 |
G05D23/19 |
主分类号 |
G05D23/19 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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