DEVELOP APPARATUS FOR SEMICONDUCTOR MANUFACTURE

摘要

A developing apparatus for a semiconductor device fabrication is provided to reduce the loss of a wafer and to improve qualities of products by preventing the contamination of the wafer using a cleaning unit. A developing apparatus for a semiconductor device fabrication includes a body(100), a spin chuck, a nozzle unit, a nozzle base and a cleaning unit. The spin chuck(110) is installed on the body in order to load stably a wafer. The nozzle unit(300) is installed at the body. The nozzle unit includes a spraying port(321) capable of spraying a developer. The nozzle base(400) is installed at the body in order to supply a space capable of storing the nozzle unit. The cleaning unit is installed on the nozzle base in order to clean the spraying port.