发明名称 |
Verwijderen van randkorrels bij immersielithografie. |
摘要 |
A method of performing immersion lithography on a semiconductor wafer is provided. The method includes providing a layer of resist onto a surface of the semiconductor wafer. Next, an edge-bead removal process spins the wafer at a speed greater than 1000 revolutions per minute and dispenses solvent through a nozzle while the wafer is spinning. Then, the resist layer is exposed using an immersion lithography exposure system. |
申请公布号 |
NL1032067(A1) |
申请公布日期 |
2007.01.09 |
申请号 |
NL20061032067 |
申请日期 |
2006.06.28 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHING-YU CHANG;CHIEN-CHOU KE;VINCENT YU |
分类号 |
H01L21/3105 |
主分类号 |
H01L21/3105 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|