Deposition source and deposition apparatus using the same,申请号KR20050008794-传众专利搜索

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发明名称	Deposition source and deposition apparatus using the same
摘要
申请公布号	KR100666575(B1)	申请公布日期	2007.01.09
申请号	KR20050008794	申请日期	2005.01.31
申请人		发明人
分类号	H05B33/10;C23C14/26	主分类号	H05B33/10
代理机构		代理人
主权项
地址

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