发明名称 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography
摘要 A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location.
申请公布号 US7160673(B2) 申请公布日期 2007.01.09
申请号 US20030677804 申请日期 2003.10.02
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 MENON RAJESH;GIL DARIO;CARTER DAVID J.;BARBASTATHIS GEORGE;SMITH HENRY I.
分类号 G02B3/08;G03F1/00;G03F7/00;G03F7/075;G03F7/20;G03H1/00;G21G5/00 主分类号 G02B3/08
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