发明名称 Method of producing synthetic quartz glass
摘要 Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90-120� so that the porous silica matrix has a density of 0.1-1.0 g/cm<SUP>3 </SUP>with a narrow distribution within 0.1 g/cm<SUP>3</SUP>. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.
申请公布号 US7159418(B2) 申请公布日期 2007.01.09
申请号 US20010930693 申请日期 2001.08.17
申请人 SHIN-ETSU CHEMICAL CO, LTD. 发明人 MATSUO KOJI;OTSUKA HISATOSHI;SHIROTA KAZUO;MAIDA SHIGERU
分类号 C03B19/14;G03F1/14;C03B8/04;C03B20/00;C03C3/06;G03F1/60;H01L21/027 主分类号 C03B19/14
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