发明名称 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems
摘要 A plasma processing system includes a reactor, a top electrode made of a magnetic or ferromagnetic metal or a metal-alloy, wherein a RF or DC power is applied to generate plasma within the reactor; a gas showerhead fixed to the top electrode; a sheet-like magnetic assembly bound to the upper surface of the gas showerhead, which includes a plurality of separate magnets, a metal sheet made of a ferromagnetic metal, and a deformable film.
申请公布号 US7159537(B2) 申请公布日期 2007.01.09
申请号 US20040874535 申请日期 2004.06.24
申请人 ANELVA CORPORATION 发明人 WICKRAMANAYAKA SUNIL;ISHIHARA MASAHITO;NOZAKI YOSHIKAZU;DOI HIROSHI
分类号 C23C16/455;H05H1/46;C23C14/34;C23C14/35;C23C16/00;C23C16/503;C23F4/00;H01J37/32;H01L21/205;H01L21/304;H01L21/3065 主分类号 C23C16/455
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