| 摘要 |
A unit layer posttreating catalytic chemical vapor deposition apparatus that not only can enhance, with respect to silicon nitride films and the like, in-plane uniformity, step coverage and film quality but also for each unit layer, can perform surface treatment after film layer formation to thereby produce a thin film; and a method of unit layer posttreating film formation. There is provided a method for laminating of thin films posttreated for each unit layer, comprising repeating a cycle of steps consisting of the film formation step of introducing a mixed gas containing silane gas and ammonia gas as a raw gas in the form of rectangular pulse in reaction vessel (2) and performing catalytic pyrolysis of the raw gas by means of catalytic material (8) to thereby superimpose a silicon nitride film on substrate (5); the one surface treatment step of bringing ammonia gas into contact with the catalytic material (8) and realizing exposure of the surface of silicon nitride film on the substrate (5) to the ammonia gas; and the other surface treatment step of bringing hydrogen gas into contact with the catalytic material (8) and realizing exposure of the surface of silicon nitride film on the substrate (5) to the hydrogen gas. ® KIPO & WIPO 2007
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