发明名称 Simulation method, simulation program, and semiconductor device manufacturing method each employing boundary conditions
摘要 An aspect of the present invention provides a method of carrying out a simulation with simulation data, including, determining whether or not the simulation data includes boundary conditions set for a boundary of a calculation area set for the simulation, computing the influence of the boundary conditions on the inside of the calculation area if the simulation data includes the boundary conditions, displaying the influence of the boundary conditions on the inside of the calculation area, prompting to enter an instruction whether or not the boundary conditions are changed, and if an instruction to make no change in the boundary conditions is entered, carrying out the simulation with the simulation data.
申请公布号 US7162400(B2) 申请公布日期 2007.01.09
申请号 US20010028319 申请日期 2001.12.28
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ITO SANAE;AMAKAWA HIROTAKA
分类号 G06F17/50;H01L21/00;H01L29/00 主分类号 G06F17/50
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