METHOD AND APPARATUS FOR TREATING EXHAUST GAS

摘要

A method for treating an exhaust gas, which comprises the steps of introducing an exhaust gas being in an exited state in a facility for manufacture of a semiconductor device into a plasma treatment portion of a treating section under a reduced pressure, introducing the exhaust gas being maintained in an exited state by a plasma generating in the plasma treatment portion into a reactor in a removal reaction section, reacting the exhaust gas with a removing reaction agent comprised of particulate calcium oxide packed in the reactor and removing harmful gas components in the exhaust gas. The method may further include the step of supplying oxygen into the plasma treatment portion so as to subject the harmful gas components to oxidation decomposition in the presence of a plasma and then reacting the decomposed gas components with the removing reaction agent. ® KIPO & WIPO 2007