| 摘要 |
<p>A chamber isolation valve RF(Radio Frequency) grounding method is provided to restrain the leak of plasma in the ambient of a chamber isolation valve. A chamber isolation valve(101) is controlled to be moved to a closed state position. At least one or more electric conductive members are used for connecting electrically one or more predetermined elements of a plasma processing system with the chamber isolation valve. The predetermined elements are in electrically grounded states. An electric conductive elastic member is used as the electric conductive member. Volume resistance of the elastic member is in a predetermined range of 0.200 ohm-cm or less after a heat aging test.</p> |
