| 发明名称 |
CALIXRESORCINARENE COMPOUNDS, PHOTORESIST BASE MATERIALS, AND COMPOSITIONS THEREOF |
| 摘要 |
<p>Calixresorcinarene compounds represented by the general formula (1): [wherein R is 2-methyl-2- adamantyloxycarbonylmethyl or the like]. The compounds are useful as photoresist base material, particularly for nanofabrication with extreme ultraviolet rays or electron beam. ® KIPO & WIPO 2007</p> |
| 申请公布号 |
KR20070003980(A) |
申请公布日期 |
2007.01.05 |
| 申请号 |
KR20067020033 |
申请日期 |
2006.09.27 |
| 申请人 |
IDEMITSU KOSAN CO., LTD. |
发明人 |
ISHII HIROTOSHI;OWADA TAKANORI;SHIBASAKI YUZI;UEDA MITSURU |
| 分类号 |
C07C69/712;C07C37/20;C07C39/17;C07C67/31;C07C69/00;C07C69/708;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C07C69/712 |
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