| 摘要 |
A blank mask for an LCD and a method for manufacturing a photo-mask are provided to be capable of applying wet-etching technique to a large-sized mask, by controlling plural films, which constitute the blank mask or the photo-mask, to have different etching rates with respect to the same etching solution. A first layer is formed on a transparent substrate(10), wherein the first layer includes at least one of a light shielding layer(30) and a first reflection preventing layer(40). A first pattern(20a) is formed by wet-etching the first layer. A second layer(50) is formed on the resultant substrate, wherein the second layer includes at least one of a second reflection preventing layer(60) and a semi-transmissive layer(70). A resist is spread on the second layer. A first etching rate of the light shielding layer is smaller than a second etching rate of the semi-transmissive layer. The etching rates of the first and second reflection preventing layers have levels between the first etching rate and the second etching rate. |
