| 摘要 |
<p>A lithographic apparatus and a device manufacturing method are provided to treat stably a variety of substrates including a non-standard substrate without a large deformation of the lithographic apparatus or a treatment station, to improve the exactness of alignment of the non-standard substrate and to reduce the contamination of the treatment station. A lithographic apparatus includes a substrate table and a projection system. The substrate table is used for supporting a first substrate(1) of a first type. The substrate table has a polished surface. The projection system is used for projecting a patterned radiation beam onto a target portion of the first substrate. The polished surface is capable of supporting a second substrate(2) of a second type. The projection system is capable of projecting the patterned radiation beam onto the second substrate.</p> |
