METHOD FOR FABRICATING CMOS IMAGE SENSOR

摘要

A method for manufacturing a CMOS image sensor is provided to improve photo efficiency by obtaining an aiming curvature from a microlens in spite of the decrease of size of a pixel. A plurality of microlens resin layers are formed on a predetermined structure corresponding to each pixel. A pin type rod reaches for each resin layer. A microlens(36) with an aiming curvature is formed by performing a heat treatment on the resultant structure. The pin type rod is made of a silicon oxide layer. The pin type rod reaches a predetermined position adjacent to the resin layer. The predetermined position and the resin layer are spaced apart from as much as 0.1 micrometer.