发明名称 STRUCTURE AND MANUFACTURING METHOD OF ANTI-ADHESIVE HYBRID MASK AND NANO IMPRINTING METHOD THEREBY
摘要 <p>A structure of a stamp having an adhesion preventing layer, a manufacturing method thereof, and a nano pattern imprinting method using the same are provided to prevent an adhesion of a partial imprinting layer to a stamp by forming the adhesion preventing layer on a surface of the stamp. A nano-sized pattern is formed on a transparent substrate(11). An opaque metal layer(13) is formed corresponding to a partial surface of the transparent substrate. A first thin film layer(14) is formed on the surface of the opaque metal layer to reduce at least one of surface energy and friction coefficient. A second thin film layer(15) is formed on the first thin film layer to increase hydrophobicity. A buffer layer is formed between the opaque metal layer and the first thin film to increase adhesive strength.</p>
申请公布号 KR100665038(B1) 申请公布日期 2007.01.04
申请号 KR20050061325 申请日期 2005.07.07
申请人 IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) 发明人 PARK, IN SUNG;LEE, HEON;SHIN, SU BUM;MOON, KANG HUN;AHN, JIN HO
分类号 H01L21/027 主分类号 H01L21/027
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