发明名称 |
Werkwijzen en systeem voor het onderdrukken van defectvorming bij immersielithografie. |
摘要 |
An immersion lithography system includes an immersion fluid holder for containing an immersion fluid. The system further includes a stage for positioning a resist-coated semiconductor wafer in the immersion fluid holder and a lens proximate to the immersion fluid holder and positionable for projecting an image through the immersion fluid and onto the resist-coated semiconductor wafer. The immersion fluid holder includes a coating configured to reduce contaminate adhesion from contaminates in the immersion fluid. |
申请公布号 |
NL1032092(A1) |
申请公布日期 |
2007.01.04 |
申请号 |
NL20061032092 |
申请日期 |
2006.06.29 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHING-YU CHANG;BURN JENG LIN |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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