| 摘要 |
<p>A fluid for an immersion lithography system is provided to prevent the damage of stage sensors by discharging an electrostatic energy using a conductive material. A fluid(230) for an immersion lithography system contains a first element and a second element. The second element contains a predetermined material. The predetermined material of the second element is capable of changing the resistivity of the first element. The first element contains water, distilled water, deionized water or distilled deionized water. The second element further contains predetermined gas. The second element is capable of being made of CO2, O2, N2, a material containing nitrogen, or a material containing oxygen.</p> |
