DUAL-WAVELENGTH POSITIVE-WORKING RADIATION-SENSITIVE ELEMENTS

摘要

A positive-working radiation-sensitive composition comprises a polymer capable of being eluted in an alkaline aqueous solution and a development-enhancing compound. The positive-working photosensitive composition has good sensitivity for use with a ultra-violet radiation or infrared laser radiation source. The composition is stable in its state before exposure and has an excellent handling property. The sensitivity of a radiation-sensitive coating based on the composition is increased without compromising the handling characteristics. Positive-working radiation-sensitive elements based on the composition have good development latitude. They are developable using an alkaline aqueous solution, and may be used with a radiation source in lithographic applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications.