Lithographic apparatus and device manufacturing method

摘要

A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA₀ and an aperture system; a projection lens having a first numerical aperture NA_OB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NA_OB1 of the projection lens is smaller than the numerical aperture NA₀ of the illumination unit.