| 摘要 |
<p>An Electron-beam exposure apparatus is used for exchanging automatically a new aperture with an aiming pattern without a halt of the apparatus by using an aperture exchanging unit. An electron-beam exposure apparatus has a column structure. The column structure of the electron-beam exposure apparatus includes a plurality of first apertures(104,108), wherein each first aperture is capable of forming an electron beam into an aiming shape. A plurality of aperture exchanging units(130,140) are installed at side portions of the column structure. The plurality of aperture exchanging units are used for transferring one out of a plurality of second apertures to the column structure.</p> |
