发明名称 Low-temperature catalyzed formation of segmented nanowire of dielectric material
摘要 The present invention discloses a method of forming a segmented nanowire including: providing a substrate; pre-cleaning the substrate; pre-treating the substrate; forming and placing a catalyst over the substrate; and forming the segmented nanowire over the catalyst with recurring pulses of plasma-enhanced chemical vapor deposition (PECVD) of a dielectric material.
申请公布号 US2007004225(A1) 申请公布日期 2007.01.04
申请号 US20050174076 申请日期 2005.06.30
申请人 LU DONGHUI;CHEN ZHAN 发明人 LU DONGHUI;CHEN ZHAN
分类号 H01L21/469 主分类号 H01L21/469
代理机构 代理人
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