SUBSTRATE PROCESSING METHOD

摘要

A method for processing a substrate is provided to restrain defects due to collision of particles by setting a moving speed of a substrate less than an upper-limit value. A substrate(201) is installed in a vessel(210) at vacuum atmosphere. In the vessel, the substrate is moved in a predetermined relative speed with respect to the vessel such that a substrate process is performed. During the substrate process, an upper-limited value about the number of defects and concentration thereof is determined. The defects are generated on the substrate. The predetermined relative speed is set less than a relative speed of which the number of detects or the concentration thereof becomes an upper-limited value.