| 摘要 |
<p>A reaction chamber for a semiconductor manufacturing apparatus capable of reducing the formation of particles and the semiconductor manufacturing apparatus. The reaction chamber for the semiconductor manufacturing apparatus comprises a support body having an opening part formed at a predetermined position and movable in the vertical direction, a raising member inserted into the opening part and movable in the vertical direction, a restriction member fixed to the lower side of the support body at the position of the opening part, and a reaction chamber which stores the support body, the raising member, and the restriction member and into which a reactive gas is supplied.</p> |
