发明名称 |
Method and apparatus for inspecting pattern defects |
摘要 |
A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.
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申请公布号 |
US2007002318(A1) |
申请公布日期 |
2007.01.04 |
申请号 |
US20060518195 |
申请日期 |
2006.09.11 |
申请人 |
YOSHIDA MINORU;MAEDA SHUNJI;SHIMODA ATSUSHI;SAKAI KAORU;OKABE TAKAFUMI |
发明人 |
YOSHIDA MINORU;MAEDA SHUNJI;SHIMODA ATSUSHI;SAKAI KAORU;OKABE TAKAFUMI |
分类号 |
G01N21/88;G01N21/00;G01N21/95;G01N21/956 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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