<p>An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.</p>
申请公布号
WO2007002374(A2)
申请公布日期
2007.01.04
申请号
WO2006US24446
申请日期
2006.06.23
申请人
US;US;US;US
发明人
PARTLO, WILLIAM, N.;ERSHOV, ALEXANDER, I.;FOMENKOV, IGOR, V.