发明名称 Material systems for dielectrics and metal electrodes
摘要 A structure having a dielectric layer that includes a dielectric material comprising a first metal nitride, and an electrode layer disposed over the dielectric layer, the electrode layer comprising a second metal nitride, with the first metal nitride and the second metal nitride having at least one metal in common. Alternatively, structure has a dielectric layer including a dielectric material comprising a metal oxide, and an electrode layer disposed over the dielectric layer, the electrode layer comprising a metal nitride. The metal oxide and the metal nitride each comprise at least one of a rare earth metal, a group IIIA metal, an alkali metal, an alkaline earth metal, and a transition metal, and the metal oxide and the metal nitride comprise the same metal. An interfacial layer may be disposed under the dielectric layer.
申请公布号 US2007001231(A1) 申请公布日期 2007.01.04
申请号 US20050170341 申请日期 2005.06.29
申请人 AMBERWAVE SYSTEMS CORPORATION 发明人 CURRIE MATTHEW T.
分类号 H01L29/94 主分类号 H01L29/94
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