发明名称 A SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS WITH A PASSIVE SUBSTRATE GRIPPER
摘要 <p>According to one aspect of the present invention, a passive substrate gripper, including first and second segments, is provided. The second segment may be connected to the first segment, and the first and second segments may jointly form a substrate support. The substrate support may be shaped to support a substrate in first position within the substrate support when the substrate support is in a first angular orientation. The substrate may be removable from substrate support in a first direction when in the first position. The substrate may move into a second position when the substrate support is moved into a second angular orientation. The substrate may not be removable in the first direction when in the second position within the substrate support. The passive substrate gripper may also include a support ledge extending from opposing inner surfaces of the first and second segments, on which the substrate is supported.</p>
申请公布号 WO2007001663(A2) 申请公布日期 2007.01.04
申请号 WO2006US18703 申请日期 2006.05.15
申请人 APPLIED MATERIALS, INC.;WADENSWEILER, RALPH, M.;ENDO, RICK, R.;KO, ALEXANDER, S. 发明人 WADENSWEILER, RALPH, M.;ENDO, RICK, R.;KO, ALEXANDER, S.
分类号 B65H1/00 主分类号 B65H1/00
代理机构 代理人
主权项
地址