| 发明名称 |
Photoresist application over hydrophobic surfaces |
| 摘要 |
A method of forming a layer of photoresist 28 over a surface 30 of a semiconductor wafer 10 by forming a layer of pre-wet solvent 52 over the surface 30 and forming the layer of photoresist 28 over the layer of pre-wet solvent 52 . Also, a layer of photoresist 28 formed by this method.
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| 申请公布号 |
US7157386(B2) |
申请公布日期 |
2007.01.02 |
| 申请号 |
US20040981880 |
申请日期 |
2004.11.05 |
| 申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
ANDRES PAUL L.;SALINAS ADRIAN |
| 分类号 |
H01L21/31;H01L21/469 |
主分类号 |
H01L21/31 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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