发明名称 Solid-state image sensing device and method of fabricating a solid-state image sensing device
摘要 A solid-state image sensing device is provided. In the device, a first floating p-type well and a second floating p-type well are disposed so as to overlap each other and are respectively provided in a light-receiving area and the area of a field effect transistor for light signal detection. A circular gate electrode is disposed so as to cover the overlapping section of the first floating p-type well with the second floating p-type well and is formed on an n-type channel doped layer.
申请公布号 US7157758(B2) 申请公布日期 2007.01.02
申请号 US20040973987 申请日期 2004.10.26
申请人 SEIKO EPSON CORPORATION 发明人 MIZUGUCHI AKIRA
分类号 H01L31/062;H01L21/00;H01L27/146;H01L29/43 主分类号 H01L31/062
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