发明名称 |
VACUUM SYSTEM OF A APPARATUS OF MANUFACTURING A SEMICONDUCTOR SUBSTRATE AND MONITORING METHOD OF THE SAME |
摘要 |
A vacuum system of a semiconductor substrate processing apparatus and a monitoring method thereof are provided to prevent a pumped material from flowing reversely into a process chamber by blocking automatically an opening/closing valve in an abnormal vacuum pump state using a control unit. A vacuum system of a semiconductor substrate processing apparatus includes a vacuum pump(120) for controlling the degree of vacuum in a process chamber, opening/closing valves(116,118,124) for opening/closing vacuum lines connected to the process chamber and the vacuum pump, a current detecting unit(130) for detecting a driving current capable of operating the vacuum pump, and a control unit. The control unit(140) controls the opening/closing valves in order to prevent the backflow in the vacuum lines.
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申请公布号 |
KR20070000063(A) |
申请公布日期 |
2007.01.02 |
申请号 |
KR20050055500 |
申请日期 |
2005.06.27 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KO, HYUN KUK;PARK, IN SUN;KIL, JUNG HWAN;KOO, BON OK;HA, JAE GYU;SON, JANG HO |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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