发明名称 Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
摘要 Pulse parameters of a gas discharge laser system can be optimized and controlled for precision applications such as microlithography. Important laser pulse parameters typically vary in the beginning of a pulse burst, and the directionality of the output beam typically varies throughout the burst. In order to improve the performance of the laser system, the variation at the beginning of a pulse burst can be eliminated by extending the pulse pattern and shuttering the output during periods of significant parameter variation. A fast shutter such as an acousto-optical modulator can be used to prevent output during the burst transition processes. Elements such as acousto-optical cells also can be used in combination with a fast position sensor to steer the direction of the output beam, in order to adjust for variations in the direction of the beam between pulses in a burst.
申请公布号 US7158553(B2) 申请公布日期 2007.01.02
申请号 US20040776404 申请日期 2004.02.11
申请人 LAMBDA PHYSIK AG 发明人 GOVORKOV SERGEI V.;WIESSNER ALEXANDER O.;PAETZEL RAINER;BRAGIN IGOR
分类号 H01S3/22;H01S3/10;H01S3/223;H01S3/225;H01S3/23 主分类号 H01S3/22
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