发明名称 |
Process monitoring device for sample processing apparatus and control method of sample processing apparatus |
摘要 |
A plasma processing apparatus for processing a sample within a vacuum vessel, including: a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data; data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus; a signal filter for converting the monitor data within the selected detection time range into an effective signal; a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and a display screen for displaying the patterned physical-shape predicted value; wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.
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申请公布号 |
US7158848(B2) |
申请公布日期 |
2007.01.02 |
申请号 |
US20060356099 |
申请日期 |
2006.02.17 |
申请人 |
HITACHI, LTD. |
发明人 |
TANAKA JUNICHI;KITSUNAI HIROYUKI;YAMAMOTO HIDEYUKI;IKUHARA SHOJI;TAKAHASHI KAZUE |
分类号 |
G06F19/00;H01L21/205;G05B23/02;H01L21/00;H01L21/02 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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