发明名称 |
Method for controlling the ferric ion content of a plating bath containing iron |
摘要 |
A system and method for reducing ferric ion content in a plating solution by exposing hydrogen to an electrode in a plating solution for reducing a ferric ion content in the plating solution.
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申请公布号 |
US7156972(B2) |
申请公布日期 |
2007.01.02 |
申请号 |
US20030427232 |
申请日期 |
2003.04.30 |
申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. |
发明人 |
DIEL WOLFGANG;PEEKEMA RICHARD M.;RAMASUBRAMANIAN MURALI |
分类号 |
C25D21/06;C25D7/12;C25D21/18 |
主分类号 |
C25D21/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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