发明名称 Laser scanning apparatus and methods for thermal processing
摘要 Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
申请公布号 US7157660(B2) 申请公布日期 2007.01.02
申请号 US20040806014 申请日期 2004.03.22
申请人 ULTRATECH, INC. 发明人 TALWAR SOMIT;THOMPSON MICHAEL O.;MARKLE DAVID A.
分类号 B23K26/00;B23K26/03;B23K26/04;B23K26/073;B23K26/08 主分类号 B23K26/00
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