发明名称 |
Laser scanning apparatus and methods for thermal processing |
摘要 |
Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
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申请公布号 |
US7157660(B2) |
申请公布日期 |
2007.01.02 |
申请号 |
US20040806014 |
申请日期 |
2004.03.22 |
申请人 |
ULTRATECH, INC. |
发明人 |
TALWAR SOMIT;THOMPSON MICHAEL O.;MARKLE DAVID A. |
分类号 |
B23K26/00;B23K26/03;B23K26/04;B23K26/073;B23K26/08 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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