SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD

摘要

A substrate cleaning apparatus and a substrate cleaning method are provided to remove effectively foreign materials from a surface of a substrate by improving a structure thereof. A substrate cleaning apparatus supplies liquid and gas to a spray nozzle(18), mixes the liquid and the gas, sprays fluid of the liquid and the gas through the spray nozzle to a surface of a glass substrate(14) in order to clean the glass substrate. The substrate cleaning apparatus includes a liquid heating unit(22) for heating the liquid to be supplied to the spray nozzles in order to control the temperature of the liquid. The temperature of the liquid at an inlet of the spray nozzle is controlled at 40 degrees centigrade to 100 degrees centigrade.