APPARATUS FOR PLASMA PROCESSING

摘要

A plasma processing apparatus is provided to prevent generation of particles from an inner wall of a plasma chamber by controlling the pressure of the plasma chamber. A plasma chamber(100) is used for generating plasma. A process chamber(300) is connected with the plasma chamber in order to perform a process by using the plasma. A connective member(200) is used for connecting the plasma chamber with the process chamber. A pressure control unit(400) is installed at the connective member in order to control the pressure of the plasma chamber. The connective member includes a path in order to transfer the plasma to the process chamber. The pressure control unit controls the pressure of the plasma chamber by controlling a size of the path.