METHOD FOR MANUFACTURING IMAGE SENSOR

摘要

A method for manufacturing an image sensor is provided to increase a margin in a micro-lens process by forming uniformly a thickness of a color filter array. A passivation layer(201) is formed on a semiconductor substrate(100) including optical sensing units(103). A color filter array(203) is formed on an upper surface of the passivation layer. A planarization layer is formed on an upper surface of the color filter array. The planarization layer is removed by performing an etch process in order to form uniformly the thickness of the color filter array. A plurality of micro-lenses(207) are formed on an upper surface of the color filter array.